Open AccessStructural Evolution and Electrical Properties of Highly Active Plasma Process on 4H-SiC
Author(s) -
Dae-Kyoung Kim,
MannHo Cho
Publication year - 2017
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2017.26.5.133
Subject(s) - plasma , process (computing) , chemistry , materials science , computer science , physics , operating system , quantum mechanics
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