Open AccessEnhanced Anti-reflective Effect of SiNx/SiOx/InSnO Multi-layers using Plasma Enhanced Chemical Vapor Deposition System with Hybrid Plasma Source
Author(s) -
M. Choi,
Ohyung Kwon,
S.D. Choi,
JuYeoul Baek,
Kyoung-Joon An,
KwunBum Chung
Publication year - 2016
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2016.25.4.73
Subject(s) - plasma enhanced chemical vapor deposition , refractive index , chemical vapor deposition , materials science , plasma , transmittance , deposition (geology) , layer (electronics) , sputtering , surface roughness , analytical chemistry (journal) , thin film , optoelectronics , chemistry , nanotechnology , composite material , paleontology , physics , chromatography , quantum mechanics , sediment , biology
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