Open AccessEnhancement of Size Gradient of Imprinted Nanopattern by Plasma Etching under a Nonuniform Magnetic Field
Author(s) -
Jong-hwan Lim,
Soohyun Kim,
Da Sol Kim,
Mira Jeong,
Jaejong Lee,
Wan Soo Yun
Publication year - 2015
Publication title -
applied science and convergence technology/han'gug jin'gong hag'hoeji
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2015.24.5.184
Subject(s) - materials science , polarizer , etching (microfabrication) , magnetic field , magnet , plasma etching , plasma , substrate (aquarium) , optics , optoelectronics , analytical chemistry (journal) , nanotechnology , chemistry , layer (electronics) , physics , chromatography , oceanography , birefringence , quantum mechanics , geology