Open AccessNumerical Modeling of an Inductively Coupled Plasma Sputter Sublimation Deposition System
Author(s) -
Junghoon Joo
Publication year - 2014
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2014.23.4.179
Subject(s) - inductively coupled plasma , plasma , sublimation (psychology) , sputtering , analytical chemistry (journal) , materials science , atomic physics , sputter deposition , electron temperature , poisson's equation , plasma parameters , substrate (aquarium) , chemistry , ion , thin film , physics , nanotechnology , psychology , oceanography , organic chemistry , chromatography , quantum mechanics , geology , psychotherapist
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