Open AccessAtomic Layer Deposition of HfO2Films on Ge
Author(s) -
Young Joon Cho,
Hyo Sik Chang
Publication year - 2014
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2014.23.1.40
Subject(s) - suboxide , materials science , atomic layer deposition , substrate (aquarium) , annealing (glass) , layer (electronics) , analytical chemistry (journal) , diffusion barrier , oxide , deposition (geology) , chemical engineering , chemistry , nanotechnology , metallurgy , paleontology , oceanography , sediment , geology , engineering , biology , chromatography
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