Open AccessPredicting Thin Film Stoichiometry In V-O2 Reactive Sputtering
Author(s) -
He Yu,
Tao Wang,
Xiang Dong,
Yadong Jiang,
Roland Wu
Publication year - 2015
Publication title -
materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.208
H-Index - 24
eISSN - 2029-7289
pISSN - 1392-1320
DOI - 10.5755/j01.ms.21.2.6910
Subject(s) - sputtering , stoichiometry , vanadium , x ray photoelectron spectroscopy , thin film , materials science , vanadium oxide , oxygen , valence (chemistry) , phase diagram , deposition (geology) , analytical chemistry (journal) , chemical engineering , phase (matter) , chemistry , nanotechnology , metallurgy , paleontology , organic chemistry , chromatography , sediment , engineering , biology
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