Open AccessStudy of Dry Etching of SnO thin films using a Inductively Coupled Plasma
Author(s) -
Su-Kon Kim,
Byung-Ok Park,
JoonHyung Lee,
Jeong-Joo Kim,
Young-Woo Heo
Publication year - 2016
Publication title -
journal of the korean institute of surface engineering
Language(s) - English
Resource type - Journals
eISSN - 2288-8403
pISSN - 1225-8024
DOI - 10.5695/jkise.2016.49.1.98
Subject(s) - etching (microfabrication) , inductively coupled plasma , dry etching , reactive ion etching , sputtering , materials science , thin film , analytical chemistry (journal) , plasma etching , chamber pressure , plasma , sputter deposition , optoelectronics , nanotechnology , chemistry , metallurgy , layer (electronics) , environmental chemistry , physics , quantum mechanics
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