Deposition Characteristics of TiO2 Thin Films Prepared by DC Pulsed Magnetron Sputtering | Zendy

Eunsol An | Zendy; Sung-Bo Heo | Zendy; KyuSik Kim | Zendy; Uoo Chang Jung | Zendy; Yong Ho Park | Zendy; In-Wook Park | Zendy

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Deposition Characteristics of TiO<sub>2</sub> Thin Films Prepared by DC Pulsed Magnetron Sputtering

Author(s) -

Eunsol An,

Sung-Bo Heo,

KyuSik Kim,

Uoo Chang Jung,

Yong Ho Park,

In-Wook Park

Publication year - 2015

Publication title -

journal of the korean institute of surface engineering

Language(s) - English

Resource type - Journals

eISSN - 2288-8403

pISSN - 1225-8024

DOI - 10.5695/jkise.2015.48.2.43

Subject(s) - materials science , scanning electron microscope , sputter deposition , microstructure , surface roughness , substrate (aquarium) , thin film , pulsed dc , cavity magnetron , deposition (geology) , sputtering , composite material , surface finish , fabrication , contact angle , analytical chemistry (journal) , chemical engineering , nanotechnology , chemistry , medicine , paleontology , oceanography , alternative medicine , pathology , sediment , geology , biology , chromatography , engineering

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