Open AccessThe Study of Improvement in the Characteristics of Oxide Thin Film Transistor by using Atmospheric Pressure Plasma
Author(s) -
Ga Young Kim,
Kyong Nam Kim,
Geun Young Yeom
Publication year - 2015
Publication title -
han-gug pyomyeon geumsog hag-hoe/han-guk pyomyeon gonghak hoeji
Language(s) - English
Resource type - Journals
eISSN - 2288-8403
pISSN - 1225-8024
DOI - 10.5695/jkise.2015.48.1.007
Subject(s) - atmospheric pressure plasma , atmospheric pressure , materials science , thin film transistor , transistor , oxide , optoelectronics , plasma , environmental science , nanotechnology , meteorology , electrical engineering , engineering , physics , metallurgy , layer (electronics) , quantum mechanics , voltage