
Behavior of Solid Phase Crystallization of Amorphous Silicon Films at High Temperatures according to Raman Spectroscopy
Author(s) -
Won-Eui Hong,
JaeSang Ro
Publication year - 2010
Publication title -
han-gug pyomyeon geumsog hag-hoe/han-guk pyomyeon gonghak hoeji
Language(s) - English
Resource type - Journals
eISSN - 2288-8403
pISSN - 1225-8024
DOI - 10.5695/jkise.2010.43.1.007
Subject(s) - materials science , crystallization , polycrystalline silicon , nucleation , crystallite , raman spectroscopy , crystallinity , silicon , amorphous silicon , amorphous solid , nanocrystalline silicon , thin film transistor , annealing (glass) , chemical engineering , crystalline silicon , composite material , crystallography , optoelectronics , metallurgy , optics , chemistry , physics , organic chemistry , layer (electronics) , engineering