Open AccessDeposition of c-BN Films on Tungsten Carbide Insert Tool by Microwave Plasma Enhanced Chemical Vapor Deposition(MPECVD)
Author(s) -
Su-Jong Yoon,
Taegyu Kim
Publication year - 2008
Publication title -
journal of the korean institute of surface engineering
Language(s) - English
Resource type - Journals
eISSN - 2288-8403
pISSN - 1225-8024
DOI - 10.5695/jkise.2008.41.2.043
Subject(s) - materials science , chemical vapor deposition , raman spectroscopy , tungsten carbide , boron nitride , crystallinity , analytical chemistry (journal) , argon , scanning electron microscope , boron carbide , thin film , electron cyclotron resonance , tungsten , plasma , nanotechnology , chemistry , metallurgy , composite material , optics , physics , organic chemistry , chromatography , quantum mechanics
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