z-logo
open-access-imgOpen Access
Effective Channel Mobility of AlGaN/GaN-on-Si Recessed-MOS-HFETs
Author(s) -
Hyun-Seop Kim,
Seo-Weon Heo,
HoYoung Cha
Publication year - 2016
Publication title -
jsts journal of semiconductor technology and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.156
H-Index - 19
eISSN - 2233-4866
pISSN - 1598-1657
DOI - 10.5573/jsts.2016.16.6.867
Subject(s) - materials science , optoelectronics , electric field , heterojunction , threshold voltage , transistor , channel (broadcasting) , electron mobility , oxide , field effect , voltage , electrical engineering , physics , engineering , quantum mechanics , metallurgy

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom