Open AccessCrystallization and Characterization of GeSn Deposited on Si with Ge Buffer Layer by Low-temperature Sputter Epitaxy
Author(s) -
Jeongmin Lee,
Il Hwan Cho,
Dongsun Seo,
Seongjae Cho,
ByungGook Park
Publication year - 2016
Publication title -
journal of semiconductor technology and science/journal of semiconductor technology and science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.156
H-Index - 19
eISSN - 2233-4866
pISSN - 1598-1657
DOI - 10.5573/jsts.2016.16.6.854
Subject(s) - materials science , epitaxy , optoelectronics , sputtering , layer (electronics) , crystallite , sputter deposition , thin film , substrate (aquarium) , buffer (optical fiber) , nanotechnology , metallurgy , computer science , telecommunications , oceanography , geology