Open AccessInvestigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition parameters on structural properties and hardness of TiAlN films deposited by reactive pulsed DC magnetron sputtering
Author(s) -
Jariyaporn Rukkun,
Kamon Aiempanakit,
Pimchanok Reakaukot,
Witthawat Wongpisan,
Kirati Waree,
Montri Aiempanakit
Publication year - 2021
Publication title -
warasan loha, watsadu lae lae
Language(s) - English
Resource type - Journals
ISSN - 0857-6149
DOI - 10.55713/jmmm.v31i2.1083
Subject(s) - materials science , nanoindentation , substrate (aquarium) , biasing , sputter deposition , scanning electron microscope , pulsed dc , sputtering , crystallinity , thin film , zirconium nitride , metallurgy , composite material , nitride , analytical chemistry (journal) , titanium nitride , nanotechnology , layer (electronics) , voltage , oceanography , physics , chemistry , quantum mechanics , chromatography , geology