Open AccessDependence of Structural and Electrical Properties of Sputtered-Fe3O4 Thin Films on Gas Flow Rate
Author(s) -
Vo Doan Thanh Truong,
Thi Truong An Le,
Huu Nhut Nguyen,
Hoang Trung Huynh,
Thi Kim Hang Pham
Publication year - 2022
Publication title -
technical education science/giáo dục kỹ thuật
Language(s) - English
Resource type - Journals
eISSN - 2615-9740
pISSN - 1859-1272
DOI - 10.54644/jte.72a.2022.1237
Subject(s) - materials science , curie temperature , thin film , grain size , electrical resistivity and conductivity , sputter deposition , spintronics , condensed matter physics , volumetric flow rate , magnetoresistance , sputtering , analytical chemistry (journal) , composite material , nanotechnology , ferromagnetism , magnetic field , thermodynamics , chemistry , physics , engineering , quantum mechanics , chromatography , electrical engineering
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