Open AccessDistribution of Ions and Molecules Density in N2/NH3/SiH4 Inductively Coupled Plasma with Pressure and Gas Mixture Ratio)
Author(s) -
Kwon-Sang Seo,
Donghyun Kim,
HoJun Lee
Publication year - 2017
Publication title -
the transactions of the korean institute of electrical engineers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.174
H-Index - 11
eISSN - 2287-4364
pISSN - 1975-8359
DOI - 10.5370/kiee.2017.66.2.370
Subject(s) - analytical chemistry (journal) , ion , chemistry , inductively coupled plasma , silane , electron ionization , molecule , electron density , silicon nitride , silanes , plasma , ionization , silicon , physics , organic chemistry , chromatography , quantum mechanics
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