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Analysis of Percentage of Arcing between Pantograph and Overhead Contact Line as a Function of Duration of Arc
Author(s) -
Young Park,
Kiwon Lee,
Sam-Young Kwon,
Chulmin Park,
JaeKwang Kim,
Won Seok Choi
Publication year - 2014
Publication title -
the transactions of the korean institute of electrical engineers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.174
H-Index - 11
eISSN - 2287-4364
pISSN - 1975-8359
DOI - 10.5370/kiee.2014.63.6.855
Subject(s) - pantograph , electric arc , catenary , overhead line , arc (geometry) , engineering , electrical engineering , overhead (engineering) , automotive engineering , line (geometry) , structural engineering , mechanical engineering , mathematics , physics , electrode , geometry , quantum mechanics

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