Open AccessGenetic Control of Learning and Prediction: Application to Modeling of Plasma Etch Process Data
Author(s) -
Hyung-Soo Uh,
Kwan-Woong Gwak,
Byungwhan Kim
Publication year - 2007
Publication title -
je-eo lobos siseutem haghoe nonmunji/jeeo robot siseutem hakoe nonmunji
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.215
H-Index - 11
eISSN - 2233-4335
pISSN - 1976-5622
DOI - 10.5302/j.icros.2007.13.4.315
Subject(s) - backpropagation , artificial neural network , plasma etching , genetic algorithm , etch pit density , computer science , scanning electron microscope , process (computing) , materials science , face (sociological concept) , artificial intelligence , etching (microfabrication) , machine learning , biological system , nanotechnology , composite material , layer (electronics) , social science , sociology , operating system , biology