Open AccessA Wafer Alignment Method and Accuracy Evaluation
Author(s) -
H. Park,
Joon Lyou
Publication year - 2002
Publication title -
journal of control automation and systems engineering
Language(s) - English
Resource type - Journals
ISSN - 1225-9845
DOI - 10.5302/j.icros.2002.8.9.812
Subject(s) - wafer , eccentricity (behavior) , orientation (vector space) , enhanced data rates for gsm evolution , rotation (mathematics) , position (finance) , standard deviation , development (topology) , geometry , optics , mathematics , materials science , computer science , physics , mathematical analysis , optoelectronics , statistics , computer vision , finance , political science , law , economics
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