Open AccessJoint Diffusion of Gallium and Phosphorus Atoms in Silicon
Author(s) -
Н. Ф. Зикриллаев,
S. B. Isamov,
S. Koveshnikov,
Z. T. Kenzhaev,
Kh. S. Turekeev
Publication year - 2022
Publication title -
èlektronnaâ obrabotka materialov
Language(s) - English
Resource type - Journals
eISSN - 2345-1718
pISSN - 0013-5739
DOI - 10.52577/eom.2022.58.4.29
Subject(s) - gallium , silicon , lattice diffusion coefficient , diffusion , impurity , analytical chemistry (journal) , ion , solubility , chemistry , phosphorus , chemical physics , materials science , inorganic chemistry , effective diffusion coefficient , thermodynamics , chromatography , organic chemistry , medicine , physics , magnetic resonance imaging , radiology