Open AccessThe Effect of Annealing Methods on Dopant Activation and Damage Recovery of Phosphorous ion Shower Doped Poly-Si
Author(s) -
김동민,
노재상,
이기용
Publication year - 2005
Publication title -
journal of the korean electrochemical society/jeongi hwahag hoeji
Language(s) - English
Resource type - Journals
eISSN - 2288-9000
pISSN - 1229-1935
DOI - 10.5229/jkes.2005.8.1.024
Subject(s) - materials science , doping , transmittance , raman spectroscopy , annealing (glass) , dopant activation , dopant , crystallinity , analytical chemistry (journal) , sheet resistance , irradiation , optoelectronics , chemistry , optics , composite material , physics , chromatography , layer (electronics) , nuclear physics