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4.1.4 Work Function Analysis of Gas Sensitive WO3 Layers with Pt Doping
Author(s) -
G. Halek,
Helena Teterycz,
P. Halek,
P. Sochorska,
K. Wiśniewski,
Iain D. Baikie
Publication year - 2012
Publication title -
proceedings imcs 2012
Language(s) - English
Resource type - Conference proceedings
DOI - 10.5162/imcs2012/4.1.4
Subject(s) - kelvin probe force microscope , work function , tungsten trioxide , materials science , volta potential , scanning electron microscope , doping , microstructure , tungsten , layer (electronics) , dopant , analytical chemistry (journal) , platinum , nanotechnology , oxide , chemical engineering , optoelectronics , composite material , metallurgy , chemistry , atomic force microscopy , chromatography , biochemistry , engineering , catalysis

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