Open AccessOptical control system for the growth of Si3N4 films on quartz substrates applied by the method of reactive magnetron sputtering of silicon target
Author(s) -
M. A. Koov,
Stanislav Rastopov
Publication year - 2022
Publication title -
prikladnaâ fizika
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.205
H-Index - 7
ISSN - 1996-0948
DOI - 10.51368/1996-0948-2022-1-70-74
Subject(s) - sputtering , silicon , quartz , materials science , high power impulse magnetron sputtering , optoelectronics , sputter deposition , cavity magnetron , nanotechnology , metallurgy , thin film