Open AccessDirect measurement of potentials in a reactive ion-plasma etching system
Author(s) -
А. В. Абрамов
Publication year - 2021
Publication title -
prikladnaâ fizika
Language(s) - English
Resource type - Journals
ISSN - 1996-0948
DOI - 10.51368/1996-0948-2021-3-26-32
Subject(s) - ambipolar diffusion , plasma , etching (microfabrication) , ion , plasma etching , reactive ion etching , diffusion , atomic physics , materials science , chemistry , nanotechnology , physics , layer (electronics) , organic chemistry , quantum mechanics , thermodynamics
Devices for direct measurement of the plasma potential and floating potential in a gas dis-charge in a reactive ion-plasma etching system are presented. The action of the devices devel-oped for this purpose is based on the creation of a local magnetic field that allows purposeful-ly changing the conditions of ambipolar diffusion of charged particles. This makes it possible to contact the probe with the body of a positive plasma column without the appearance of a floating potential on it. The results of measuring the plasma potential by the proposed and al-ternative methods are compared