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Adsorption Reactions of Trimethylgallium and Arsine on H/Si(100)-2x1 Surface
Publication year - 2009
Publication title -
bulletin of the korean chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.237
H-Index - 59
eISSN - 1229-5949
pISSN - 0253-2964
DOI - 10.5012/bkcs.2009.30.8.1805
Subject(s) - arsine , trimethylgallium , chemistry , adsorption , hydrogen , methane , inorganic chemistry , photochemistry , organic chemistry , layer (electronics) , catalysis , phosphine , metalorganic vapour phase epitaxy , epitaxy

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