Silicasulfuric Acid/NaNO2as a New Reagent for Deprotection of S,S-Acetals under Solvent-free Conditions
Author(s) -
Abdol R. Hajipour
Publication year - 2005
Publication title -
bulletin of the korean chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.237
H-Index - 59
eISSN - 1229-5949
pISSN - 0253-2964
DOI - 10.5012/bkcs.2005.26.5.808
Subject(s) - reagent , chemistry , solvent , organic chemistry , combinatorial chemistry
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