Open AccessOPTICAL AND MASS SPECTRA FROM REACTIVE PLASMA AT MAGNETRON DEPOSITION OF TANTALUM OXYNITRIDE
Author(s) -
С.В. Дудин,
S. Yakovin,
А. В. Зыков,
Nina Yefymenko
Publication year - 2021
Publication title -
problems of atomic science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.216
H-Index - 17
eISSN - 1562-6016
pISSN - 1682-9344
DOI - 10.46813/2021-131-122
Subject(s) - cavity magnetron , analytical chemistry (journal) , tantalum , plasma , materials science , dissociation (chemistry) , sputter deposition , inductively coupled plasma , mass spectrometry , oxygen , chemistry , sputtering , thin film , environmental chemistry , metallurgy , nanotechnology , physics , nuclear physics , chromatography , organic chemistry
Processes in reactive plasma during the magnetron deposition of tantalum oxynitride with ICP activation of reactive gas are studied in dependence on Oxygen fraction. Results of spectroscopic study of optical emission from the plasma and of mass-spectrometry of gas composition in the vacuum chamber in response to ignition of magnetron discharge and inductively coupled plasma are presented. It is shown that dissociation level of all species grows with the magnetron current increase while its dependence on oxygen/nitrogen ratio is non-monotonic.