Open AccessCONTROL OF IONIZATION PROCESSES IN MAGNETRON SPUTTERING SYSTEM BY CHANGING MAGNETIC FIELD CONFIGURATION
Author(s) -
А.G. Chunadra,
K. N. Sereda,
I. K. Tarasov,
V.А. Makhlai
Publication year - 2021
Publication title -
problems of atomic science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.216
H-Index - 17
eISSN - 1562-6016
pISSN - 1682-9344
DOI - 10.46813/2021-131-102
Subject(s) - anode , ionization , sputtering , cathode , atomic physics , plasma , electrode , cavity magnetron , materials science , sputter deposition , ion , magnetic field , charged particle , electron , physics , chemistry , nuclear physics , nanotechnology , thin film , quantum mechanics
This work is devoted to measuring the function of the distribution of charged particles of gas-discharge plasma in a magnetron sputtering system under conditions of non-potential "earth". Measurements are carried out with the help of a three-electrode probe, which is installed in the cathode sputtering zone, with unsafe electrodes and housing. The selection of the analyzed particles was carried out through a screen located under floating potential. Effect of additional magnetic insulation anode of MSS МАG-5 on ion and electron distribution functions was investigated.