Open AccessBEHAVIOR OF THE Ti-Zr-Ni THIN FILM CONTAINING QUASICRYSTALLINE AND APPROXIMANT PHASES UNDER RADIATIVE-THERMAL ACTION IN TRANSITION MODES
Author(s) -
S.V. Malykhin,
V.А. Makhlai,
S.V. Surovitskiy,
I.E. Garkusha,
S.S. Herashchenko,
В. В. Кондратенко,
I. А. Kopylets,
E. N. Zubarev,
S. S. Borisova,
A.V. Fedchenko
Publication year - 2020
Publication title -
problems of atomic science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.216
H-Index - 17
eISSN - 1562-6016
pISSN - 1682-9344
DOI - 10.46813/2020-126-003
Subject(s) - materials science , thin film , isothermal process , substructure , plasma , diffraction , irradiation , sputter deposition , quasicrystal , hydrogen , annealing (glass) , sputtering , analytical chemistry (journal) , condensed matter physics , composite material , crystallography , thermodynamics , optics , nanotechnology , chemistry , nuclear physics , physics , structural engineering , organic chemistry , chromatography , engineering
X-ray diffraction and SEM microscopy were used to study the structural and phase changes in a thin film obtained by magnetron sputtering of a Ti52Zr30Ni18 target (at.%) on a steel substrate under the radiation-thermal influence of pulsed hydrogen plasma on an QSPA Kh-50 accelerator. A technique has been worked out for the formation of the quasicrystalline and crystal-approximant phases as a result of high-speed quenching using pulsed action with a heat load of 0.6 MJ/m2. The changes in the contents of these phases as well as in their structure and substructure parameters were studied during isothermal vacuum annealing at a temperature of 550 °C and also as a result of irradiation with 5 plasma pulses in the range of heat load from 0.1 to 0.4 MJ/m2. The quasicrystalline phase was found to be resistant to irradiation with hydrogen plasma.