Open AccessDEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE
Author(s) -
А.С. Куприн,
S.A. Leonov,
В.Д. Овчаренко,
E.N. Reshetnyak,
В.А. Белоус,
Р.Л. Василенко,
G.N. Tolmachova,
В.И. Коваленко,
Ye.V. Klymenko
Publication year - 2019
Publication title -
problems of atomic science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.216
H-Index - 17
eISSN - 1562-6016
pISSN - 1682-9344
DOI - 10.46813/2019-123-154
Subject(s) - titanium nitride , tin , materials science , deposition (geology) , biasing , substrate (aquarium) , coating , plasma , titanium , nitride , adhesion , nitrogen , ion plating , arc (geometry) , vacuum arc , composite material , voltage , analytical chemistry (journal) , chemical engineering , layer (electronics) , metallurgy , chemistry , electrical engineering , mathematics , oceanography , engineering , biology , paleontology , geometry , quantum mechanics , physics , organic chemistry , sediment , geology , chromatography
The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated.