DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE | Zendy

А.С. Куприн | Zendy; S.A. Leonov | Zendy; В.Д. Овчаренко | Zendy; E.N. Reshetnyak | Zendy; В.А. Белоус | Zendy; R.L. Vasilenko | Zendy; G.N. Tolmachova | Zendy; V.І. Kovalenko | Zendy; І.О. Klimenko | Zendy

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DEPOSITION OF TiN-BASED COATINGS USING VACUUM ARC PLASMA IN INCREASED NEGATIVE SUBSTRATE BIAS VOLTAGE

Author(s) -

А.С. Куприн,

S.A. Leonov,

В.Д. Овчаренко,

E.N. Reshetnyak,

В.А. Белоус,

R.L. Vasilenko,

G.N. Tolmachova,

V.І. Kovalenko,

І.О. Klimenko

Publication year - 2019

Publication title -

problems of atomic science and technology

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.216

H-Index - 17

eISSN - 1562-6016

pISSN - 1682-9344

DOI - 10.46813/2019-123-154

Subject(s) - titanium nitride , tin , materials science , deposition (geology) , biasing , substrate (aquarium) , coating , plasma , titanium , nitride , adhesion , nitrogen , ion plating , arc (geometry) , vacuum arc , composite material , voltage , analytical chemistry (journal) , chemical engineering , layer (electronics) , metallurgy , chemistry , electrical engineering , mathematics , oceanography , engineering , biology , paleontology , geometry , quantum mechanics , physics , organic chemistry , sediment , geology , chromatography

The paper presents the results of the study on the influence of a high substrate bias voltage from 300 up to 1300 V on the titanium nitride coating deposition under nitrogen pressure of 2 Pa. The deposition rate, phase and chemical composition, adhesion and mechanical properties of coatings, macroparticle number and size distribution were investigated.

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