Open AccessFabrication of surface-enhanced Raman scattering substrate using black silicon layer manufactured through reactive ion etching
Author(s) -
Hyeong Ju Kim,
Bong-Hwan Kim,
Dongin Lee,
BongHee Lee,
Chanseob Cho
Publication year - 2021
Publication title -
journal of sensor science and technology
Language(s) - English
Resource type - Journals
eISSN - 2093-7563
pISSN - 1225-5475
DOI - 10.46670/jsst.2021.30.4.267
Subject(s) - black silicon , fabrication , materials science , reactive ion etching , etching (microfabrication) , layer (electronics) , substrate (aquarium) , raman scattering , silicon , deep reactive ion etching , optoelectronics , raman spectroscopy , nanotechnology , optics , medicine , oceanography , alternative medicine , physics , pathology , geology
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