Open AccessEffect of Process Parameters of UV Enhanced Gas Phase Cleaning on the Removal of PMMA (Polymethylmethacrylate) from a Si Substrate
Author(s) -
Sung Ku Kwon,
Do Hyun Kim
Publication year - 2016
Publication title -
transactions on electrical and electronic materials/transactions on electrical and electronic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.201
H-Index - 18
eISSN - 2092-7592
pISSN - 1229-7607
DOI - 10.4313/teem.2016.17.4.204
Subject(s) - materials science , substrate (aquarium) , irradiation , etching (microfabrication) , analytical chemistry (journal) , gas phase , dissociation (chemistry) , chemical engineering , composite material , chromatography , organic chemistry , oceanography , chemistry , engineering , geology , physics , layer (electronics) , nuclear physics