Open AccessFabrication of a Graphene Nanoribbon with Electron Beam Lithography Using a XR-1541/PMMA Lift-Off Process
Author(s) -
Sang-Chul Jeon,
Young-Su Kim,
Dong-Kyu Lee
Publication year - 2010
Publication title -
transactions on electrical and electronic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.201
H-Index - 18
eISSN - 2092-7592
pISSN - 1229-7607
DOI - 10.4313/teem.2010.11.4.190
Subject(s) - materials science , graphene , resist , electron beam lithography , fabrication , lithography , photoresist , optoelectronics , raman spectroscopy , nanotechnology , graphene nanoribbons , field effect transistor , photolithography , transistor , etching (microfabrication) , layer (electronics) , optics , medicine , alternative medicine , physics , pathology , quantum mechanics , voltage
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