Open AccessElectrical and Optical Properties of ITO Films Sputtered by RF -bias Voltage and In-Sn Alloy Target
Author(s) -
Hyun-Hoo Kim,
Shin Sungho
Publication year - 2004
Publication title -
transactions on electrical and electronic materials/transactions on electrical and electronic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.201
H-Index - 18
eISSN - 2092-7592
pISSN - 1229-7607
DOI - 10.4313/teem.2004.5.4.153
Subject(s) - materials science , substrate (aquarium) , biasing , optoelectronics , sputtering , transmittance , electrical resistivity and conductivity , rf power amplifier , radio frequency , sputter deposition , thin film , deposition (geology) , alloy , voltage , metallurgy , electrical engineering , nanotechnology , amplifier , paleontology , oceanography , cmos , sediment , geology , biology , engineering