Open AccessModeling and Simulation on Ion Implanted and Annealed Indium Distribution in Silicon Using Low Energy Bombardment
Author(s) -
Won-Chae Jung
Publication year - 2016
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2016.29.12.750
Subject(s) - indium , ion implantation , materials science , silicon , wafer , doping , optoelectronics , sputtering , ion , annealing (glass) , electronic engineering , nanotechnology , composite material , chemistry , thin film , engineering , organic chemistry
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