Effects of Rapid Thermal Annealing on the Conduction of a-IGZO Films
Author(s) -
Dohoon Kim,
Won-Ju Cho
Publication year - 2016
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2016.29.1.11
Subject(s) - materials science , thin film transistor , annealing (glass) , thermal conduction , x ray photoelectron spectroscopy , conductivity , electron , optoelectronics , thin film , analytical chemistry (journal) , composite material , nanotechnology , chemistry , chemical engineering , physics , layer (electronics) , quantum mechanics , chromatography , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom