Open AccessAFM and C-F Properties of Ceramic Thin Film with Annealing Method
Author(s) -
Woon-Shik Choi
Publication year - 2015
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2015.28.9.598
Subject(s) - materials science , annealing (glass) , thin film , surface roughness , analytical chemistry (journal) , capacitance , surface finish , dielectric , atomic force microscopy , sputtering , composite material , electrode , ceramic , mineralogy , optoelectronics , nanotechnology , chemistry , chromatography
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