Open AccessPhotocatalyst Surface Properties of the Oxide Thin Films According to the Plasma Etching Process
Author(s) -
ChangHyun Lee,
Sung-Bo Seo,
Jiyong Oh,
Ik-Hyeon Jin,
Sunyoung Sohn,
Hwa-Min Kim
Publication year - 2015
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2015.28.5.300
Subject(s) - materials science , contact angle , wetting , etching (microfabrication) , oxide , plasma , sputtering , chemical engineering , plasma etching , photocatalysis , thin film , sputter deposition , composite material , nanotechnology , metallurgy , layer (electronics) , chemistry , organic chemistry , catalysis , physics , quantum mechanics , engineering
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