Open AccessAnalysis of Growth Mechanism of Al Thin Film by in-situ Surface Reflectance Measurement During MOCVD Process
Author(s) -
Ki-Soo Kim,
Moon Kyu Seo
Publication year - 2015
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2015.28.2.104
Subject(s) - metalorganic vapour phase epitaxy , materials science , reflectivity , in situ , mechanism (biology) , process (computing) , thin film , composite material , optoelectronics , optics , nanotechnology , computer science , chemistry , epitaxy , layer (electronics) , physics , organic chemistry , philosophy , epistemology , operating system
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