Open AccessThe Etching Characteristics of the TaN Thin Films Using Inductively Coupled Plasma
Author(s) -
Chen Li,
Young-Hee Joo,
JongChang Woo,
Hansoo Kim,
Kyung-Rok Choi,
Chang-Il Kim
Publication year - 2013
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2013.26.1.1
Subject(s) - x ray photoelectron spectroscopy , etching (microfabrication) , thin film , materials science , analytical chemistry (journal) , inductively coupled plasma , plasma etching , plasma , reactive ion etching , chemistry , layer (electronics) , composite material , nanotechnology , nuclear magnetic resonance , physics , chromatography , quantum mechanics
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