Open AccessProperties of Nb-doped TiO2Transparent Conducting Oxide Film Fabricated by RF Magnetron Sputtering
Author(s) -
Minyoung Kim,
Mun-Seong Cho,
Donggun Lim,
Jae-Hwan Park
Publication year - 2012
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2012.25.3.204
Subject(s) - materials science , electrical resistivity and conductivity , sputtering , sputter deposition , annealing (glass) , doping , transmittance , optoelectronics , cavity magnetron , oxide , thin film , high power impulse magnetron sputtering , analytical chemistry (journal) , composite material , metallurgy , nanotechnology , electrical engineering , chemistry , engineering , chromatography
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