Open AccessStudy on the Electrical Properties of Amorphous HfInZnO TFTs Depending on Sputtering Power
Author(s) -
Dong-Youn Yoo,
Eugene Chong,
DoHyung Kim,
ByeongKwon Ju,
Sang-Yeol Lee
Publication year - 2011
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2011.24.8.674
Subject(s) - sputtering , materials science , thin film transistor , amorphous solid , optoelectronics , sputter deposition , hafnium , transistor , threshold voltage , analytical chemistry (journal) , layer (electronics) , voltage , thin film , electrical engineering , metallurgy , zirconium , chemistry , nanotechnology , organic chemistry , engineering , chromatography
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