Open AccessStudy on Electrical Characteristics of Hafnium Silicate Films with Low Temperature O2Annealing
Author(s) -
Jung-Chan Lee,
Kwang-Sook Kim,
Seokwon Jeong,
Yonghan Roh
Publication year - 2011
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2011.24.5.370
Subject(s) - annealing (glass) , oxidizing agent , materials science , hafnium , silicate , atomic layer deposition , forming gas , oxide , chemical engineering , metallurgy , thin film , analytical chemistry (journal) , nanotechnology , chemistry , zirconium , engineering , organic chemistry , chromatography
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