Open AccessA Study of the Silicon Mold Surface Treatment Using CHF3Plasma for Nano Imprint Lithography
Author(s) -
YoungKeun Kim,
Jae Hyun Kim,
Ban Seok You,
Ji-Su Jang,
KwangHo Kwon
Publication year - 2011
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2011.24.10.790
Subject(s) - contact angle , x ray photoelectron spectroscopy , materials science , scanning electron microscope , mold , molding (decorative) , silicon , composite material , inductively coupled plasma , transfer molding , torr , polymer , analytical chemistry (journal) , plasma , chemical engineering , optoelectronics , chemistry , chromatography , physics , quantum mechanics , engineering , thermodynamics
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