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The Research on Trench Etched Field Ring with Dual Ion-Implantation for Power Devices
Author(s) -
Sung-Min Yang,
Juhyun Oh,
Youngseok Bae,
Man-Young Sung
Publication year - 2010
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2010.23.5.364
Subject(s) - trench , materials science , ion implantation , breakdown voltage , optoelectronics , voltage , ring (chemistry) , dual (grammatical number) , blocking (statistics) , enhanced data rates for gsm evolution , field (mathematics) , ion , fabrication , electrical engineering , nanotechnology , computer science , engineering , physics , chemistry , layer (electronics) , telecommunications , art , mathematics , literature , quantum mechanics , organic chemistry , pure mathematics , alternative medicine , computer network , pathology , medicine

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