Open AccessProperties of SiOCH Thin Film Lour Dielectric by BTMSM/O2Flow Rates
Author(s) -
in cheol park,
Hong-Bae Kim
Publication year - 2009
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2009.22.2.132
Subject(s) - plasma enhanced chemical vapor deposition , analytical chemistry (journal) , materials science , dielectric , x ray photoelectron spectroscopy , thin film , chemical vapor deposition , volumetric flow rate , low k dielectric , nanotechnology , chemistry , chemical engineering , optoelectronics , organic chemistry , physics , quantum mechanics , engineering
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