Open AccessProperties of Dielectric Constant and Bonding Mode of Annealed SiOCH Thin Film
Author(s) -
Jongwook Kim,
Chang-Su Hwang,
Yong-Heon Park,
Hong-Bae Kim
Publication year - 2009
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2009.22.1.047
Subject(s) - dielectric , plasma enhanced chemical vapor deposition , thin film , materials science , analytical chemistry (journal) , annealing (glass) , fourier transform infrared spectroscopy , chemical vapor deposition , composite material , chemistry , nanotechnology , optics , organic chemistry , optoelectronics , physics
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