Open AccessCharacteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings
Author(s) -
Young-Ryeol Kim,
Yongseob Park,
Wonseok Choi,
Byungyou Hong
Publication year - 2008
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2008.21.7.660
Subject(s) - materials science , tin , sputter deposition , cavity magnetron , thin film , composite material , pulsed dc , metallurgy , sputtering , nanotechnology
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