z-logo
open-access-imgOpen Access
Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings
Author(s) -
Young-Ryeol Kim,
Yongseob Park,
Wonseok Choi,
Byungyou Hong
Publication year - 2008
Publication title -
jeon'gi jeonja jaeryo haghoe nonmunji/jeon-gi jeonja jaeryo hakoe nonmunji
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2008.21.7.660
Subject(s) - materials science , tin , sputter deposition , cavity magnetron , thin film , composite material , pulsed dc , metallurgy , sputtering , nanotechnology

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here