Open AccessThe Characteristic Variation of Mask with Plasma Treatment
Author(s) -
Jwayeon Kim,
Sang-Su Choi,
ByungSun Kang,
Dong-Soo Min,
Young-Jin An
Publication year - 2008
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2008.21.2.111
Subject(s) - etching (microfabrication) , photolithography , dry etching , materials science , surface roughness , reactive ion etching , plasma etching , plasma , impurity , analytical chemistry (journal) , plasma cleaning , surface finish , wet cleaning , composite material , chemistry , optoelectronics , chromatography , physics , organic chemistry , layer (electronics) , quantum mechanics
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