Open AccessElectrical Characteristics of Ni/Ti/Al Ohmic Contacts to Al-implanted p-type 4H-SiC
Author(s) -
SungJae Joo,
Jae Yeol Song,
In-Ho Kang,
Wook Bahng,
Sang-Cheol Kim,
NamKyun Kim
Publication year - 2008
Publication title -
journal of the korean institute of electrical and electronic material engineers
Language(s) - English
Resource type - Journals
eISSN - 2288-3258
pISSN - 1226-7945
DOI - 10.4313/jkem.2008.21.11.968
Subject(s) - ohmic contact , materials science , contact resistance , analytical chemistry (journal) , alloy , intermetallic , atmospheric temperature range , doping , metallurgy , crystallography , composite material , optoelectronics , thermodynamics , chemistry , layer (electronics) , physics , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom